Biomimetic Moth-eye Nanofabrication: Enhanced Antireflection with Superior Self-cleaning Characteristic

Jingyao Sun, Xiaobing Wang, Jinghua Wu, Chong Jiang, Jingjing Shen, Merideth A. Cooper, Xiuting Zheng, Ying Liu, Zhaogang Yang, Daming Wu

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Abstract

Sub-wavelength antireflection moth-eye structures were fabricated with Nickel mold using Roll-to-Plate (R2P) ultraviolet nanoimprint lithography (UV-NIL) on transparent polycarbonate (PC) substrates. Samples with well replicated patterns established an average reflection of 1.21% in the visible light range, 380 to 760 nm, at normal incidence. An excellent antireflection property of a wide range of incidence angles was shown with the average reflection below 4% at 50°. Compared with the unpatterned ultraviolet-curable resin coating, the resulting sub-wavelength moth-eye structure also exhibited increased hydrophobicity in addition to antireflection. This R2P method is especially suitable for large-area product preparation and the biomimetic moth-eye structure with multiple performances can be applied to optical devices such as display screens, solar cells, or light emitting diodes.

Original languageEnglish (US)
Article number5438
JournalScientific reports
Volume8
Issue number1
DOIs
StatePublished - Dec 1 2018
Externally publishedYes

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Cite this

Sun, J., Wang, X., Wu, J., Jiang, C., Shen, J., Cooper, M. A., Zheng, X., Liu, Y., Yang, Z., & Wu, D. (2018). Biomimetic Moth-eye Nanofabrication: Enhanced Antireflection with Superior Self-cleaning Characteristic. Scientific reports, 8(1), [5438]. https://doi.org/10.1038/s41598-018-23771-y