Location of the antiplasticizer in cross-linked epoxy resins by 2H, 15N, and 13C REDOR NMR

Matthew E. Merritt, Jon M. Goetz, Duane Whitney, Chang Po Paul Chang, Laurent Heux, Jean Louis Halary, Jacob Schaefer

Research output: Contribution to journalArticle

23 Scopus citations

Abstract

Carbon-13 rotational-echo double-resonance (REDOR) NMR with 15N or 2H dephasing, combined with 15N REDOR NMR with 13C dephasing, has been obtained for a fully cross-linked epoxy resin prepared from a nominally uniform mixture of two parts of diglycidyl ether of Bisphenol A, one part of hexamethylenediamine, and 19% (by weight) antiplasticizer made from a carbonyl-13C-labeled aromatic acetamide. The antiplasiticizer contains the hydroxypropyl ether moiety of the epoxy repeat unit. A partially cross-linked resin was formed from five parts of epoxide, one part of hexamethylene-diamine, three parts of hexylamine, and 19% (by weight) antiplasticizer. Labels were introduced into the resin by replacing both methyl groups of the isopropylidene moiety of Bisphenol A with CD3 groups and by using [15N2]hexamethylenediamine and [15N]hexylamine (and their unlabeled counterparts) in various combinations. The antiplasticizer 13C-carbonyl carbon is 4.9 ± 0.5 Å from an amine 15N (with no preference for free or cross-linked sites) and 6.7 ± 1 Å from a quaternary carbon of the isopropylidene moiety.

Original languageEnglish (US)
Pages (from-to)1214-1220
Number of pages7
JournalMacromolecules
Volume31
Issue number4
DOIs
StatePublished - Feb 24 1998

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

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    Merritt, M. E., Goetz, J. M., Whitney, D., Chang, C. P. P., Heux, L., Halary, J. L., & Schaefer, J. (1998). Location of the antiplasticizer in cross-linked epoxy resins by 2H, 15N, and 13C REDOR NMR. Macromolecules, 31(4), 1214-1220. https://doi.org/10.1021/ma9708306