Molecular tailoring of surfaces via pulsed RF plasma depositions

V. Panchalingam, X. Chen, Charles R. Savage, Richard B. Timmons, Robert C. Eberhart

Research output: Chapter in Book/Report/Conference proceedingConference contribution

70 Citations (Scopus)

Abstract

The use of a variable duty cycle, pulsed RF plasma, in lieu of a continuous wave (CW) plasma, is employed for plasma polymerization of diverse monomers. The monomers discussed in this work include vinyltrimethylsilane, perfluoro-2-butyl tetrahydrofuran, and dichloro-methane. For each of these monomers, progressive changes in the molecular composition of the plasma deposited films are observed with systematic changes in the pulsed RF duty cycle employed during the deposition step, all other plasma variables being maintained constant. Significantly different film chemistry and deposition rates are observed in contrasting CW with equivalent wattage pulsed plasmas. Overall, the results obtained indicate that the use of variable duty cycle pulsed RF plasmas offer a promising approach to molecular tailoring of the film chemistry which occurs during plasma polymerizations.

Original languageEnglish (US)
Title of host publicationJournal of Applied Polymer Science: Applied Polymer Symposium
PublisherJohn Wiley & Sons Inc
Pages123-141
Number of pages19
Edition54
StatePublished - 1994
EventProceedings of the American Chemical Society Symposium on Plasma Deposition of Polymeric Thin Films: Chemistry, Characterization, and Applications - Denver, CO, USA
Duration: Mar 28 1993Mar 29 1993

Other

OtherProceedings of the American Chemical Society Symposium on Plasma Deposition of Polymeric Thin Films: Chemistry, Characterization, and Applications
CityDenver, CO, USA
Period3/28/933/29/93

Fingerprint

Plasma deposition
Plasmas
Plasma polymerization
Monomers
Plasma waves
Deposition rates
Methane
Chemical analysis

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Panchalingam, V., Chen, X., Savage, C. R., Timmons, R. B., & Eberhart, R. C. (1994). Molecular tailoring of surfaces via pulsed RF plasma depositions. In Journal of Applied Polymer Science: Applied Polymer Symposium (54 ed., pp. 123-141). John Wiley & Sons Inc.

Molecular tailoring of surfaces via pulsed RF plasma depositions. / Panchalingam, V.; Chen, X.; Savage, Charles R.; Timmons, Richard B.; Eberhart, Robert C.

Journal of Applied Polymer Science: Applied Polymer Symposium. 54. ed. John Wiley & Sons Inc, 1994. p. 123-141.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Panchalingam, V, Chen, X, Savage, CR, Timmons, RB & Eberhart, RC 1994, Molecular tailoring of surfaces via pulsed RF plasma depositions. in Journal of Applied Polymer Science: Applied Polymer Symposium. 54 edn, John Wiley & Sons Inc, pp. 123-141, Proceedings of the American Chemical Society Symposium on Plasma Deposition of Polymeric Thin Films: Chemistry, Characterization, and Applications, Denver, CO, USA, 3/28/93.
Panchalingam V, Chen X, Savage CR, Timmons RB, Eberhart RC. Molecular tailoring of surfaces via pulsed RF plasma depositions. In Journal of Applied Polymer Science: Applied Polymer Symposium. 54 ed. John Wiley & Sons Inc. 1994. p. 123-141
Panchalingam, V. ; Chen, X. ; Savage, Charles R. ; Timmons, Richard B. ; Eberhart, Robert C. / Molecular tailoring of surfaces via pulsed RF plasma depositions. Journal of Applied Polymer Science: Applied Polymer Symposium. 54. ed. John Wiley & Sons Inc, 1994. pp. 123-141
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