Abstract
A novel and general approach to scaling diffraction intensities is presented. The method minimizes the disagreement among multiple measurements of symmetry-related reflections using a stable refinement procedure. The scale factors are described by a flexible exponential function that allows different scaling corrections to be chosen and combined according to the needs of the experiment. The scaling model presented here includes: scale and temperature factor per batch of data; temperature factor as a continuous function of the radiation dose; absorption in the crystal; uneven exposure within a single diffraction image; and corrections for phenomena that depend on the diffraction peak position on the detector. This scaling model can be extended to include additional corrections for various instrumental and data-collection problems.
Original language | English (US) |
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Pages (from-to) | 228-234 |
Number of pages | 7 |
Journal | Acta Crystallographica Section A: Foundations of Crystallography |
Volume | 59 |
Issue number | 3 |
DOIs | |
State | Published - May 2003 |
ASJC Scopus subject areas
- Structural Biology