Nanofabrication of protein-patterned substrates for future cell adhesion experiments

P. A. Künzi, J. Lussi, L. Aeschimann, G. Danuser, M. Textor, N. F. De Rooij, U. Staufer

Research output: Contribution to journalConference article

14 Scopus citations

Abstract

A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO2. The SiO2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly-l-lysine-g-poly(ethylene glycol) was used to passivate the surrounding SiO2 against protein adsorption. The effectiveness of the process was investigated by fluorescent microscopy and scanning near-field optical microscopy on substrates which have been exposed to fluorescently labeled streptavidin.

Original languageEnglish (US)
Pages (from-to)582-586
Number of pages5
JournalMicroelectronic Engineering
Volume78-79
Issue number1-4
DOIs
StatePublished - Mar 1 2005
EventProceedings of the 30th International Conference on Micro- and Nano-Engineering -
Duration: Sep 19 2004Sep 22 2004

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Keywords

  • Electron beam lithography
  • Indium-tin-oxide
  • Nanofabrication
  • Protein adsorption
  • Protein patterning
  • Self-assembling

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Künzi, P. A., Lussi, J., Aeschimann, L., Danuser, G., Textor, M., De Rooij, N. F., & Staufer, U. (2005). Nanofabrication of protein-patterned substrates for future cell adhesion experiments. Microelectronic Engineering, 78-79(1-4), 582-586. https://doi.org/10.1016/j.mee.2004.12.073