Pulsed radio frequency plasma polymerization of allyl Alcohol: Controlled deposition of surface hydroxyl groups

Christopher L. Rinsch, Xiaolan Chen, V. Panchalingam, Robert C. Eberhart, Jenn Hann Wang, Richard B. Timmons

Research output: Contribution to journalArticlepeer-review

212 Scopus citations

Abstract

The utility of employing a variable duty cycle pulsed plasma polymerization technique to control film chemistry during plasma depositions is examined using allyl alcohol as monomer gas. Large scale progressive variations in film composition are observed with sequential changes in the plasma duty cycles employed, all other plasma variables being held constant. In particular, the - OH functionality of the monomer is increasingly retained in the plasma generated thin films as the radio frequency duty cycle is lowered. Fourier transform infrared and X-ray photoelectron spectroscopic analyses of the films obtained reveal that excellent film chemistry control is achieved during plasma polymerization of this monomer. The surface density controllability of functional groups, coupled with a gradient layering technique described herein to improve film adhesion to substrate surfaces, provides ideal opportunities for molecular tailoring of surfaces via subsequent derivatization reactions.

Original languageEnglish (US)
Pages (from-to)2995-3002
Number of pages8
JournalLangmuir
Volume12
Issue number12
DOIs
StatePublished - Jun 12 1996

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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