The preparation and microstructure study of nano metal-semiconductor film Cu:CdS

Zi Qiang Zhao, Lun Cun Wei, Hao Wang, Jin Hong Zhang, Yun Cheng Zhong, Xi Ting Lu

Research output: Contribution to journalArticle

Abstract

By using magnetic controlled sputtering of atoms and evaporating insulator medium, Cu clusters embedded in CdS, a metal-semiconductor film Cu:CdS has been successfully prepared. TEM is used in studying the microstructure of Cu clusters embedded in the medium CdS. The copper cluster is well embedded in CdS. The size of the triangle-shaped grains, Cu clusters, is from 5 nm to 20 nm. The Cu cluster and medium CdS are both of polycrystalline structures. And the Cu cluster's lattice constant expands by about 7%.

Original languageEnglish (US)
Pages (from-to)881-882
Number of pages2
JournalWuli Xuebao/Acta Physica Sinica
Volume46
Issue number5
StatePublished - May 1 1997

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'The preparation and microstructure study of nano metal-semiconductor film Cu:CdS'. Together they form a unique fingerprint.

  • Cite this

    Zhao, Z. Q., Wei, L. C., Wang, H., Zhang, J. H., Zhong, Y. C., & Lu, X. T. (1997). The preparation and microstructure study of nano metal-semiconductor film Cu:CdS. Wuli Xuebao/Acta Physica Sinica, 46(5), 881-882.