Jet rollable nanoimprint lithography with piezoelectric jetting of resist

David Gehlhausen, Shannon Menezes, Lichuan Chen, Gyu Ho Kim, Hongbing Lu, Jinming Gao, Walter Hu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.

Original languageEnglish (US)
Title of host publication2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013
Pages1172-1175
Number of pages4
DOIs
StatePublished - Dec 1 2013
Event2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013 - Beijing, China
Duration: Aug 5 2013Aug 8 2013

Publication series

NameProceedings of the IEEE Conference on Nanotechnology
ISSN (Print)1944-9399
ISSN (Electronic)1944-9380

Other

Other2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013
CountryChina
CityBeijing
Period8/5/138/8/13

ASJC Scopus subject areas

  • Bioengineering
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

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  • Cite this

    Gehlhausen, D., Menezes, S., Chen, L., Kim, G. H., Lu, H., Gao, J., & Hu, W. (2013). Jet rollable nanoimprint lithography with piezoelectric jetting of resist. In 2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013 (pp. 1172-1175). [6720909] (Proceedings of the IEEE Conference on Nanotechnology). https://doi.org/10.1109/NANO.2013.6720909