We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.
|Original language||English (US)|
|Title of host publication||Proceedings of the IEEE Conference on Nanotechnology|
|Number of pages||4|
|Publication status||Published - 2013|
|Event||2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013 - Beijing, China|
Duration: Aug 5 2013 → Aug 8 2013
|Other||2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013|
|Period||8/5/13 → 8/8/13|
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Materials Chemistry
- Condensed Matter Physics
Jet rollable nanoimprint lithography with piezoelectric jetting of resist. / Gehlhausen, David; Menezes, Shannon; Chen, Lichuan; Kim, Gyu Ho; Lu, Hongbing; Gao, Jinming; Hu, Walter.Proceedings of the IEEE Conference on Nanotechnology. 2013. p. 1172-1175 6720909.
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution