Jet rollable nanoimprint lithography with piezoelectric jetting of resist

David Gehlhausen, Shannon Menezes, Lichuan Chen, Gyu Ho Kim, Hongbing Lu, Jinming Gao, Walter Hu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.

Original languageEnglish (US)
Title of host publicationProceedings of the IEEE Conference on Nanotechnology
Pages1172-1175
Number of pages4
DOIs
Publication statusPublished - 2013
Event2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013 - Beijing, China
Duration: Aug 5 2013Aug 8 2013

Other

Other2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013
CountryChina
CityBeijing
Period8/5/138/8/13

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ASJC Scopus subject areas

  • Bioengineering
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

Cite this

Jet rollable nanoimprint lithography with piezoelectric jetting of resist. / Gehlhausen, David; Menezes, Shannon; Chen, Lichuan; Kim, Gyu Ho; Lu, Hongbing; Gao, Jinming; Hu, Walter.

Proceedings of the IEEE Conference on Nanotechnology. 2013. p. 1172-1175 6720909.

Research output: Chapter in Book/Report/Conference proceedingConference contribution