TY - GEN
T1 - Jet rollable nanoimprint lithography with piezoelectric jetting of resist
AU - Gehlhausen, David
AU - Menezes, Shannon
AU - Chen, Lichuan
AU - Kim, Gyu Ho
AU - Lu, Hongbing
AU - Gao, Jinming
AU - Hu, Walter
N1 - Copyright:
Copyright 2014 Elsevier B.V., All rights reserved.
PY - 2013
Y1 - 2013
N2 - We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.
AB - We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.
UR - http://www.scopus.com/inward/record.url?scp=84894176503&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84894176503&partnerID=8YFLogxK
U2 - 10.1109/NANO.2013.6720909
DO - 10.1109/NANO.2013.6720909
M3 - Conference contribution
AN - SCOPUS:84894176503
SN - 9781479906758
T3 - Proceedings of the IEEE Conference on Nanotechnology
SP - 1172
EP - 1175
BT - 2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013
T2 - 2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013
Y2 - 5 August 2013 through 8 August 2013
ER -